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Main uses of industrial high-purity aluminum

Release time：

2020-11-24

Industrial high-purity aluminum is mainly used as anode foil, capacitor lead, integrated circuit lead, vacuum evaporation material, stable conductor of superconductor, base metal of disk alloy and aluminum alloy with high fracture toughness for electrolytic capacitor, as well as for special purposes in scientific research and chemical industry.

Ultra-high purity aluminum has many excellent properties and is widely used. It has better conductivity, ductility, reflectivity and corrosion resistance than the original aluminum, and has a wide range of applications in the electronic industry, aerospace and other fields. 5N5-6N ultra-high purity aluminum (the maximum content of each impurity is 0.4ppm) 96% is used in the semiconductor device manufacturing industry, and 4% is used as the stabilizing material for superconducting cables.

Cathodic sputtering is an indispensable process in the manufacture of integrated circuit chips. It is a special high-tech process. The evaporated aluminum in plasma state is deposited on the cathode target surface, that is, a thin and uniform aluminum film with few defects is formed on the silicon chip, and then a layer of photosensitive resin is coated on the film. After exposure, the useless parts, namely, the non-sensitive resin, are removed, that is, the resin at these parts is corroded, The reserved extremely narrow aluminum strip is the required conductor. The more pure aluminum used for cathode sputtering, the higher its conductivity. Another important use of ultra-high purity aluminum is as wiring for integrated circuits. The trace impurities of uranium and thorium in ultra-high purity aluminum should be as little as possible, because they are radioactive elements that are released from time to time α Particles, resulting in the failure of integrated circuits, making program errors and confusion. U+Th<5ppb (wt%) in 5N2 high-purity aluminum produced by TADE, and U+Th<1ppb (wt%) in 5N5 ultra-high-purity aluminum.

5N and 5N5 large-sized plate-shaped targets are widely used in PDP and TFT-LCD flat panel displays, and sputtering targets for solar cell coating. The impurities such as Fe, Si, Cu, V, Ti in the raw materials of the plate target completely meet the corresponding standards. In the field of superconductivity, ultra-high purity aluminum is used as a stabilizing material for superconducting cables.

In the field of electronics, 5N ultra-pure aluminum is used to manufacture optoelectronic storage media, such as CD, CD-ROM, CD-RW, data disk or micro-disk, DVD silver disk, etc. In the silver disk, 5N ultra-pure aluminum sputter film is used as the light reflection layer. The impurity content in ultra-pure aluminum is very small.

The low impurity content makes ultra-pure aluminum have some special performance advantages

Typical performance characteristics

1. The impurity element content is extremely low. The lower the content of impurity elements, the lower the density of intermetallic compounds

2. Good conductivity. The 3RRR value is high, and the resistance is very small in the extremely low temperature region.

3. The light reflection performance is very strong, and has a high reflectivity to ultraviolet light!

Nantong TADE Electronic Material Technology Co., Ltd.

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